Indium, carbon and halogen doping for PMOS transistors

ABSTRACT

A method of forming an integrated circuit (IC) having at least one PMOS transistor includes performing PLDD implantation including co-implanting indium, carbon and a halogen, and a boron specie to establish source/drain extension regions in a substrate having a semiconductor surface on either side of a gate structure including a gate electrode on a gate dielectric formed on the semiconductor surface. Source and drain implantation is performed to establish source/drain regions, wherein the source/drain regions are distanced from the gate structure further than the source/drain extension regions. Source/drain annealing is performed after the source and drain implantation. The co-implants can be selectively provided to only core PMOS transistors, and the method can include a ultra high temperature anneal such as a laser anneal after the PLDD implantation.

CROSS REFERENCE TO RELATED APPLICATIONS

This application is a divisional of U.S. Nonprovisional patent application Ser. No. 12/967,105, entitled “INDIUM, CARBON AND HALOGEN DOPING FOR PMOS TRANSISTORS”, filed Dec. 14, 2010, and claims the priority of Provisional Application Ser. No. 61/287,957 entitled “SELECTIVE AMORPHIZING INDIUM, FLUORINE, CARBON CO-IMPLANT AT PLDD FOLLOWED BY LASER ANNEAL FOR IMPROVING CORE PMOS PERFORMANCE”, filed Dec. 18, 2009, which is herein incorporated by reference in its entirety.

FIELD

Disclosed embodiments relate to CMOS integrated circuits (ICs). More particularly, disclosed embodiments relate to methods for improving p-channel MOS (PMOS) transistor performance and CMOS ICs therefrom.

BACKGROUND

There is an ever increasing demand in the semiconductor industry for smaller and faster transistors to provide the functionality of the ICs used in these devices. Accordingly, in the semiconductor industry there is a continuing trend toward manufacturing ICs with higher densities. To achieve high densities, there has been and continues to be efforts toward scaling down dimensions (e.g., at submicron levels). As such, smaller feature sizes, smaller separations between features such as gate length, and more precise feature shapes are needed. This may include the width and spacing of interconnecting lines, spacing and diameter of contact holes, as well as the surface geometry of various other features (e.g., corners and edges). The scaling-down of IC dimensions can facilitate faster circuit performance and/or switching speeds, and can lead to higher effective yield in IC fabrication by providing more IC die per semiconductor wafer.

Shortening of the gate length, however, tends to raise nonconformities such as time-dependent changes in the threshold voltage due to hot carriers and degradation of mutual conductance. As one solution for the problem, MOS transistors having a so-called extension structure (a lightly doped drain (LDD structure) is known. This LDD MOS transistor structure has a pair of impurity-diffused layers which are fabricated by forming shallow source and drain extension layers, forming side walls or the like as being attached to a gate electrode, and then forming deeper source and drain regions so as to partially overlap the extension region. LDD structures can be used for both NMOS and PMOS transistors.

NMOS transistor performance in advanced CMOS integrated circuits can be enhanced by a process sequence known as the stress memorization technique (SMT), in which a layer of tensile material is deposited on the wafer after the NMOS source and drain (NSD) ion implantation process is performed and before the source/drain anneal. The SMT film may include nitride that is deposited by plasma enhanced chemical vapor deposition (PECVD), and a relatively thin oxide layer deposited under the nitride layer. An example may be that the nitride layer is about 500 Å thick and the oxide layer may then be about 100 Å thick. In the case of polysilicon gates, during the source/drain anneal, the polycrystalline silicon (poly silicon) in the NMOS gate, which became partially amorphized by the NSD ion implant, recrystallizes with a grain configuration that exerts stress on the underlying NMOS channel region when the tensile layer is removed. The resultant strain in the NMOS channel increases the mobility of the charge carriers, which improves the on-state current capability of the NMOS transistors.

However, SMT processing can degrade the performance of PMOS transistors. Degradation of PMOS transistors by SMT can occur because hydrogen in the tensile film can enhance boron diffusion in the PMOS source and drain regions which can increase short channel effects and also enhance the diffusion of boron through the PMOS gate dielectric into the channel region which can also increase short channel effects. Short channel effects increase PMOS transistor standby power which is undesirable. Moreover, PMOS hole carrier mobility can be degraded due to interface states which degrades the on-state current capability of the PMOS transistors. Although the SMT layer can be selectively removed from the PMOS transistors before source/drain anneal to avoid these detrimental effects on PMOS transistor performance, selective removal increases manufacturing cost and cycle time.

SUMMARY

Disclosed embodiments describe semiconductor fabrication to form CMOS integrated circuits (ICs) that include indium, carbon and halogen co-implants along with conventional boron into the lightly doped drain (LDD) regions of at least a portion of PMOS devices on the IC, and ICs therefrom. The disclosed co-implants may also optionally be included into the source and drain regions, and/or into halo (pocket) regions of the PMOS transistors if halo regions are included.

In one embodiment the co-implants are selectively provided so that they are received by some PMOS transistors on the IC, but at least one of the co-implants are not received by other PMOS transistors on the IC. For example, the co-implants can be provided to “core” PMOS transistors, which for example an IC including digital logic provides the logic gates, but not the “non-core” PMOS transistors on the IC (e.g., for the input/output (I/O) transistors). As used herein the gate dielectric for non-core PMOS transistors have a gate dielectric that is at least 2 Å thicker in equivalent oxide thickness (EOT), and is typically at least 4 Å thicker in EOT, as compared to the gate dielectric for the core PMOS transistors on the IC.

As described below, the addition of the indium, carbon and halogen in the LDD regions has been found to unexpectedly significantly increase PMOS drive current at the same leakage level, while lowering the gate to drain capacitance (Cgd) by allowing higher activation levels (lowering Rds) while also mitigating dopant diffusion in the PMOS transistor. Moreover, in processes including polysilicon gate electrodes and the stress memorization technique (SMT) for NMOS performance enhancement, disclosed embodiments also allow the SMT layer to remain on the PMOS transistors during source/drain anneal without significantly degrading the performance of PMOS transistors that allows elimination extra processing (that add to cost and cycle time) otherwise needed to remove the SMT from the PMOS transistors before source/drain annealing.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a flow diagram illustrating an example methodology for forming PMOS transistors, according to a disclosed embodiment.

FIGS. 2-7 are cross-sectional views of a substrate having a semiconductor surface, wherein core and non-core PMOS transistors are formed, according to a disclosed embodiment.

FIG. 8 is a block diagram depiction of an example IC including a plurality of functional blocks including digital logic blocks, a static ram (SRAM) block and an I/O block, where the PMOS transistors in the digital logic block include core PMOS transistor having indium, a halogen and carbon in their source/drain extension regions, and the I/O block and a portion of the SRAM block have non-core PMOS transistors that lack at least one of indium, halogen, and carbon in their source/drain extension regions, according to a disclosed embodiment.

DETAILED DESCRIPTION

Example embodiments are described with reference to the drawings, wherein like reference numerals are used to designate similar or equivalent elements. Illustrated ordering of acts or events should not be considered as limiting, as some acts or events may occur in different order and/or concurrently with other acts or events. Furthermore, some illustrated acts or events may not be required to implement a methodology in accordance with this disclosure.

An example methodology 100 for forming PMOS transistors is illustrated in FIG. 1, while FIGS. 2-7 are cross-sectional views of a substrate 200 having a semiconductor surface 201 wherein such a methodology is implemented. Although methodology 200 is generally described below without providing processing specifics for formation of NMOS transistors, it should be appreciated that processing specific to formation of NMOS transistors is included. The methodology 100 begins at 102 wherein a gate structure is formed over the semiconductor surface 201. In particular, a layer of gate dielectric material 210 having a first thickness and a first composition is formed over some areas of the semiconductor surface 201, while a second gate dielectric material 211 having a second thickness and a second composition is formed over other areas of the semiconductor surface 201, and a gate electrode layer 204 is formed over the layers of gate dielectric materials 210 and 211 (FIG. 2). Trench isolation region 203, such as a silicon oxide filled trench, is shown.

As known in the art, the gate dielectric material on the semiconductor surface 201 can be formed as two or more different layers varying in thickness and/or composition across its area to allow for devices having different supply voltage tolerances (e.g., core transistors and I/O transistors). For example, in one example flow, a silicon oxide layer is grown or deposited across the full area of the semiconductor surface 201. An etch process then removes the silicon oxide layer over selected areas that later receive gate dielectric material 210, and a high-k dielectric material is then deposited globally on the substrate 200. As used herein, a “high-k” dielectric provides a k-value of ≧7.8, which is at least about twice the k-value of conventional silica. As a result, the selected areas 210 can have a gate dielectric that is solely the high-k material that can be used for the core transistors, while the areas not etched by the etch process that receive gate dielectric material 211 have a dielectric stack comprising the high-k dielectric material on the silicon oxide layer that can be used for non-core (e.g., I/O) transistors.

The gate electrode layer 204 and the layers of gate dielectric material 210 and 211 are patterned to form gate structure 208 and gate structure 258 (FIG. 3). The gate structure 208 comprises a gate electrode 212 on a gate dielectric material 210, while gate structure 258 is shown comprising gate electrode 212 on a gate dielectric material 211, where the gate dielectric material 211 can be the same as gate dielectric material 210, or a dielectric having a different thickness and/or composition. In one embodiment, the gate dielectric material 211 for gate structure 258 is at least 2 Å thicker in EOT as compared to the EOT of gate dielectric 210 for gate structure 208, and in some embodiments 10 Å to 20 Å thicker in EOT.

It will be appreciated that the layers can be patterned in any suitable manner to form the gate structures 208 and 258, such as by etching, for example. It will also be appreciated that the gate electrode layer 204 thus yields a contact area or surface that provides a means for applying a voltage to the transistor for biasing the transistor.

Further, the layers of gate dielectric material 210 and 211 and the gate electrode layer 204 can be applied to the substrate 200 in any number of ways, such as with spin-on techniques, sputtering techniques (e.g., magnetron or ion beam sputtering), growth and/or deposition techniques such as chemical vapor deposition (CVD), for example. The gate dielectric materials 210 and 211 are generally formed to a thickness of about 0.5 nm to 5 nm EOT, for example, while the gate electrode layer 204 can be formed to a thickness of about 50-500 nm, for example.

Additionally, the gate electrode layer 204 generally includes doped polysilicon, SiGe or metal, and the layers of gate dielectric material 210 and 211 can comprise a high-k or ultra high-k dielectric material, for example. A dielectric material having a k-value of about 7.8 and a thickness of about 10 nm, for example, has the same EOT and is electrically equivalent to a silicon oxide gate dielectric having a k-value of about 3.9 and a thickness of about 5 nm. The layers of gate dielectric material 210 and 211 may include, for example, any one or more of the following, either alone or in combination: aluminum oxide (Al₂O₃), zirconium silicate, hafnium silicate, hafnium silicon oxynitride, hafnium oxynitride, zirconium oxynitride, zirconium silicon oxynitride, hafnium silicon nitride, lanthanum oxide (La₂O₃), hafnium oxide (HfO₂), zirconium oxide (ZrO₂), cerium oxide (CeO₂), bismuth silicon oxide (Bi₄Si₂O₁₂), titanium dioxide (TiO₂), tantalum oxide (Ta₂O₅), tungsten oxide (WO₃), yttrium oxide (Y₂O₃), lanthanum aluminum oxide (LaAlO₃), barium strontium titanate, barium strontium oxide, barium titanate, strontium titanate, PbZrO₃, lead scandium tantalate (PST), lead zirconium niobate (PZN), lead zirconate titanate (PZT) and lead magnesium niobate (PMN).

The substrate 200 may generally comprise any type of semiconductor body (e.g., silicon, SiGe, SOI) such as a semiconductor wafer or one or more die on a wafer, as well as any other type of semiconductor and/or epitaxial layers grown thereon and/or otherwise associated therewith. It will also be appreciated that the patterning of the gate electrode layer 204 and the layers of gate dielectric material 210 and 211 (as with all masking and/or patterning disclosed herein) can be performed in any suitable manner, such as with lithographic techniques, for example, where lithography broadly refers to processes for transferring one or more patterns between various media. In lithography, a light sensitive resist coating is formed over one or more layers to which a pattern is to be transferred. The resist coating is then patterned by exposing it to one or more types of radiation or light which (selectively) passes through an intervening lithography mask containing the pattern. The light causes exposed or unexposed portions of the resist coating to become more or less soluble, depending on the type of resist used. A developer is then used to remove the more soluble areas leaving the patterned resist. The patterned resist can then serve as a mask for the underlying layer or layers which can be selectively treated (e.g., etched).

After the gate structures 208 and 258 are defined, the methodology 100 proceeds to 104 wherein LDD implantation 214 and halo implantation 228 are performed with a common mask, for example, to form source/drain extension regions 216, 218 and halo region 230 and 232 for gate structure 208 as shown in FIG. 4, which after subsequent processing will be used to form core PMOS transistors. Similarly, in 105, implantation 214′ forms source/drain extension regions 216′, 218′ and implantation 228′ forms halo region 230′ and 232′ for gate structure 258 as shown in FIG. 5, which after subsequent processing will be used to form non-core PMOS transistors. It is noted that although methodology 100 is described herein implanting drain extensions and halos using the same masking level for core PMOS transistors, and a different masking level for implanting both drain extensions and halos for non-core PMOS transistors, separate masking levels can be used for implanting drain extensions and halos for both non-core and core PMOS transistors, and in the case of metal gates for gate electrodes 212, the same masking level can be used for implanting the drain extension and/or halo for both the core and non-core PMOS transistors.

It is noted that 104 and 105 can be performed in either order, so that non-core PMOS LDD/halo implantation can be performed before or after core PMOS LDD/halo implantation. Moreover, a high temperature anneal can take place between 104 and 105, such as the ultra-high temperature (UHT) anneal that is described below.

The source/drain extension regions 216, 218 for gate structure 208 are formed by co-implanting indium, carbon and at least one halogen, in addition to a boron comprising implant (B, or a molecular species such as BF₂ or C₂B₁₀H₁₂). Halogens comprise fluorine (F), chlorine (Cl), bromine (Br), iodine (I), and astatine (At). In one specific embodiment, fluorine is used as the halogen. The gate electrode 212 blocks the implanted species at LDD implantation 214 from reaching the channel so that the source/drain extension regions 216, 218 are formed in the substrate 200 on either side of the gate structure 208.

As shown in FIG. 4, the boron comprising implant and co-implants are provided to gate structure 208 which after completion of methodology 200 will become a core PMOS transistor, but not to gate structure 258 which after completion of methodology 200 will become a non-core PMOS transistor, that due to the presence of masking layer (e.g., photoresist) 262 during LDD implantation 214 and halo implantation 228 which blocks at least one of the boron comprising implant described above (B, or a molecular species such as BF₂ or C₂B₁₀H₁₂) and indium, carbon and halogen co-implants received by gate structure 208. In the embodiment shown in FIG. 4, masking layer 262 blocks the boron comprising implant, as well as the indium, carbon and halogen co-implants and halo implants received by gate structure 208 from being received by gate structure 258.

Disclosed embodiments can include gate structure 208′ which includes the gate dielectric material 210, and includes different LDD implantation as compared to gate structure 208. For example, gate structure 208′ can receive all co-implants received by gate structure 208 with a different boron comprising implant, and in addition may not receive one or more of indium, halogen and carbon co-implants received by gate structure 208. Gate structure 208′ is shown in FIG. 8 described below.

Although halo implantation 228 is described herein following LDD implantation 214, halo implantation 228 can be before the LDD implantation. One or more quad high-angle implants for halo implantation 228 may be utilized, for example, to selectively locate implanted species within the substrate 200 to form the halo regions 230, 232 for gate structure 208. Similar to the LDD implantation 214, the halo regions 230, 232 can be optionally formed by co-implanting at halo implantation 228 one or more of carbon and nitrogen with dose and energy parameters described above along with at least one n-type dopant comprising arsenic, phosphorous and/or antimony.

FIG. 5 shows LDD implantation 214′ and halo implantation 228′ performed with a common mask using masking layer 262 to form source/drain extension regions 216′, 218′ and halo regions 230′ and 232′, respectively for gate structure 258, which after completion of methodology 200 will become a non-core PMOS transistor. The source/drain extension regions 216′, 218′ include a boron comprising specie described above (B, or a molecular species such as BF₂ or C₂B₁₀H₁₂). The boron comprising implant received by gate structure 258 is generally performed using different conditions as compared to that received by gate structure 208, and gate structure 258 can also optionally receive one or more of indium, carbon and halogen co-implants using implant conditions different as compared to that received by gate structure 208 (as well as a different later through gate Vt adjust implants).

One or more quad high-angle implants 228′ may be utilized, for example, to selectively locate implanted species within the substrate 200 to form the halo regions 230′, 232′ shown in FIG. 5. Halo regions 230′, 232′ include n-type dopant from implantation 228′, but can exclude one or more of the carbon and nitrogen co-implants that can be applied to gate structure 208.

Although not shown in FIG. 4 or 5, there can be other transistors having (the thicker) gate dielectric material 211 which can receive all the drain extension implants received by gate structure 208 including the boron comprising implant, and indium, carbon and halogen co-implants. Such transistors are shown in FIG. 8 described below as being based on gate structure 258′. Such transistors have higher Vt and lower performance as compared to core PMOS transistors based on gate structure 208, and do not require a separate drain extension mask.

As known in the art, in various IC designs, such as digital signal processors (DSPs) and digital to analog converters (DACs), there are at least two sets of power supplies that provide different power supply levels to different parts of the IC, along with MOS transistors that are fabricated differently to tolerate different voltage levels. “Core” transistors are generally used for logic gates (Boolean logic gates (i.e., AND, OR, NOT, XOR, XNOR) on the IC and typically comprises the smallest geometry devices and include the thinnest gate dielectric (in terms of EOT) for the fastest operation, that need a relatively low power supply voltage to avoid breakdown. Non-core transistors, such as input/output (I/O) transistors are designed to interact with external devices typically comprise larger geometry devices and include a thicker gate dielectric for operation at higher voltages as compared to the core transistors on the IC. The I/O transistors may sustain higher voltages (e.g., 1.2 to 10 volts), such as 1.8 volts, 2.5 volts or 3.3 volts and have a threshold voltage of about 0.2 to 1.0 volts, whereas the core transistors may sustain up to only 1.4 volt and their threshold voltages may be about 0.1 to 0.5 volt. As noted above, used herein the gate dielectric for non-core PMOS transistors (e.g., PMOS I/O transistors) have a gate dielectric that is at least 2 Å thicker in EOT, and typically at least 4 Å thicker in EOT, as compared to the core PMOS transistors on the IC.

All co-doping implants described herein provide concentrations that are well above the background concentration of the respective species in the substrate materials, with each co-implant providing a minimum peak concentration on the finished IC of >1×10¹⁶ cm³. To form the source/drain extension regions 216, 218, indium may be co-implanted at a dose between 5×10¹²/cm² and 1×10¹⁵/cm², at an energy from 1 keV to 50 keV. Indium can be implanted at tilt angles between 0 to 60 deg (typically 0 to 30 deg) with multiple wafer/implant beam rotations (typically 0 to 4). The twist angle for each rotation can be 0 to 360 deg. It can be appreciated by one skilled in the art that combinations of indium co-implants with multiple doses/energies/tilt angles/rotations can be used.

Amorphizing indium has been found to enhance Cgd reduction enabled by the disclosed carbon and halogen co-implants while maintaining Rsd & Ids-Ioff, thereby improving PMOS speed. Indium has also been found to create a flatband shift which allows lower channel doping and improvement in performance. Carbon may be co-implanted at a dose between 5×10¹³/cm² and 3×10¹⁵/cm², at an energy from 1 keV to 20 keV. Carbon can be implanted at tilt angles between 0-60 deg (typically 0 to 30 deg) with multiple wafer/implant beam rotations (typically 0 to 4). The twist angle for each rotation can be 0 to 360 deg. It can be appreciated by one skilled in the art that combinations of carbon co-implants with multiple doses/energies/tilt angles/rotations can be used. Carbon can suppress the diffusion of boron and indium, and can also assist with indium activation.

The halogen co-implant dose may be between 5×10¹³/cm² and 3×10¹⁵/cm², at an energy from 1 keV to 10 keV when fluorine is used as the halogen, with the implant energy adjusted for other halogens when used to provide a projected range that matches the range for fluorine from 1 keV to 10 keV. Halogens such as fluorine can also limit the diffusion of boron, and the combination of carbon and a halogen such as fluorine can significantly reduce Cgd by limiting the diffusion of boron. The boron comprising implants 214 and 214′ at steps 104 and 105, respectively, may be at 0.1 keV to 8 keV ¹¹B equivalent energy (e.g. ¹¹BF₂@ 0.5 keV to 17.8 keV) in a dose range between 5×10¹³/cm² and 5×10¹⁵/cm². It will be appreciated that the implant conditions for boron comprising implant 214 and 214′ may be different.

Both the halogen co-implant and boron/BF₂ can be implanted at tilt angles between 0-60 deg (typically 0 to 30 deg) with multiple wafer/implant beam rotations (typically 0-4). The twist angle for each rotation can be 0-360 deg. It can be appreciated by one skilled in the art that combinations of boron/BF₂ implants and halogen co-implants with multiple doses/energies/tilt angles/rotations can be used. It will be also appreciated that the different implanted species are generally implanted separately.

For the n-type halo implant for implantations 228 and 228′, the dose can be from between 5×10¹²/cm² and 5×10¹⁴/cm², at an energy from 5 keV to 50 keV for phosphorous, 10 keV to 75 keV for arsenic, and 30 keV to 150 keV for antimony. In addition to using angled implants, implanted species are selectively directed into the substrate 200 by virtue of the gate structures 208 and 258 and optional sidewall spacers (not shown) formed on the sides of the gate structures 208 and 258 which block some of the implanted species. It will be appreciated that the implant conditions for the n-type halo implantation 228 and 228′ may be different.

Additionally, although not shown, the source/drain extension regions 216, 218 and 216′, 218′ and halo regions 230, 232 and 230′ and 232′ may be formed after thin sidewall spacers (not shown) are formed on either side of the gate structures 208 and 258. Following LDD and halo implantations, methodology 200 can include a LDD/halo anneal 106 so that the implanted species migrate laterally into a channel regions 220 and 220′ located under the gate structures 208 and 258, respectively (FIG. 6). The LDD/halo anneal 106 may comprise an ultra-high temperature (UHT) anneal.

As used herein, an UHT anneal comprises annealing conditions that provide a peak anneal temperature of between 1050° C. and 1400° C. and an anneal time at the peak temperature of generally ≦10 seconds, and typically <1 second. The combination of a UHT and carbon has been found to allow a higher level of indium activation as compared to conventionally annealing processes. The UHT annealing generally comprises a rapid thermal anneal (RTA), flash lamp anneal, or laser anneal. In one embodiment the laser or flash lamp anneal may be followed by a non-melt spike anneal. The spike anneal can comprise an RTA or a laser anneal. In the case of a laser anneal, the time can be <10 msec, such as between about 0.1 msec and 10 msec. In one embodiment the annealing comprises a 1000° C. to 1150° C. RTA spike anneal and a laser anneal at 1100° C. to 1300° C. for <10 msec. The RTA spike anneal and a laser anneal can be performed in either order.

By way of example, if the channel region 220 for gate structure 208 has a channel length 224 and the channel region 220′ for gate structure 258 has a length 224′, the source/drain extension regions 216, 218 and 216′, 218′ are shown extending under a significant portion of the channel length 224 and 224′ on either side of the gate structures 208 and 258. Further, the LDD implantations 214 and 214′ can be angled with one or more rotations and/or twists relative to a mechanical surface of the substrate 200 and/or to a lattice structure of the substrate 200 to achieve desired doping, such as to implant the implanted species under at least a portion of an existing structure (e.g., the gate structures 208 and 258) on the substrate 200, for example.

Then, at 107, source and drain implants 238 are performed to form source/drain regions 240, 242 in the substrate 200 (FIG. 7). The source/drain regions 240, 242 can be seen to be significantly deeper as compared to the source/drain extension regions 216, 218 and 216′, 218′. Sidewall spacers 244, 246 are formed on either side of the gate structures 208 and 258 to direct implanted species into select locations within the substrate 200, such that the source/drain regions 240, 242 are distanced from the gate structures 208 and 258 further than the source/drain extension regions 216, 218 and 216′, 218′. The sidewall spacers 244, 246 generally comprise a dielectric material such an oxide and/or nitride based materials, for example. Similar to the previous implantation 214 described above, the source/drain regions 240, 242 can be formed by co-implanting at least one of indium, carbon and at least one halogen, together with implanting a boron comprising species such as boron or a molecular boron species. Source and drain implants 238 are generally performed after the spacer formation.

To form the source/drain regions 240, 242, a boron comprising implant may be implanted at a dose between about 1×10¹⁵/cm² and about 2×10¹⁶/cm² at an energy of 5 to 20 keV for boron, for example. For the indium, carbon and halogen co-implant the respective dose and energy ranges described above may be used. Once the source/drain regions 240, 242 are implanted, the methodology 100 advances to 108, comprising a source/drain anneal, that can be used to provide implant activation including sources/drains for both PMOS and NMOS transistors. The source/drain anneal 108 can comprise an UHT anneal and/or as described above a UHT can be included after LDD implant and/or after halo implant. Moreover, in one flow, in addition to a UHT after LDD implant and/or after halo implant, there can be PMOS source/drain implantation, a UHT anneal, NMOS source/drain implantation followed by another UHT anneal.

In polysilicon gate CMOS processes including SMT for NMOS performance enhancement, the disclosed indium, carbon and halogen co-implants have been found allow the SMT layer to remain on the PMOS transistors during source/drain anneal without significantly degrading the performance of PMOS transistors for ICs having PMOS transistors, which can allow elimination extra processing otherwise needed to remove the SMT from the PMOS transistors before the source/drain anneal. In one process flow, the SMT layer is stripped following the source/drain anneal 108, such as a non-melt spike RTA anneal (e.g. 1040° C.), followed by a UHT anneal at least 1150° C., such as a laser anneal for <20 msec.

Disclosed embodiments also include replacement gates for at least one of the PMOS transistors and the NMOS transistors on the IC. The original gate electrodes 212, such as polysilicon gate electrodes, for at least one of the PMOS transistors and the NMOS transistors can be removed following source/drain anneal 109 to form trenches using a suitable etch process. In one embodiment, at least a portion of the gate dielectric layer can be preserved in the etch process, such as >95% of the pre-etch gate dielectric thickness. The respective gate dielectric material 210 and 211 may also be stripped and re-formed in the replacement gate flow, such as using a high-k dielectric. Metal replacement gate electrodes can then be formed in the trenches over the gate dielectric material, so that reference 212 in FIG. 7 can comprise metal gates for gate structures 208 and 258 and gate dielectric materials 210 and 211 can comprise high-k dielectrics. The metal comprising replacement gate material can comprise hafnium, zirconium, tungsten, titanium, tantalum, aluminum, a metal carbide, ruthenium, palladium, platinum, cobalt, nickel, or an electrically conductive metal oxide. As known in the art, if replacement metal gates are formed for both the PMOS and NMOS transistors, the replacement gate metal for the PMOS and NMOS transistors is generally different based on work function considerations.

Methodology 100 then advances to 109, and ends thereafter, wherein further back end processing can be performed at 109, including back end of the line (BEOL) processing including silicide and contact formation, and the formation and/or patterning of one and typically a plurality of metal and dielectric layers.

FIG. 8 is a block diagram depiction of an example IC 800 including a plurality of functional blocks including digital logic blocks 810 and 811, a static ram (SRAM) block 820 and an I/O block 830. IC 800 is shown including a substrate 200 having a semiconductor surface 201. The PMOS transistors in the digital logic blocks 810 and 811 include core PMOS transistors shown as gate structure 208 described above having indium, a halogen such as fluorine, and carbon co-doping in their source/drain extension regions, and optionally also co-doping in their halo and source/drain regions. I/O block 830 has non-core PMOS transistors shown as gate structure 258 and 258′ that lack at least one of indium, halogen, and carbon in their source/drain extension regions. As described above, gate structure 258′ has gate dielectric material 211 and can have one or all of the boron comprising implant and co-implants provided to gate structure 208. SRAM block 820 is shown having core PMOS transistors shown as gate structure 208′ and non-core PMOS transistors shown as gate structure 258. As described above, gate structure 208′ includes the gate dielectric material 210, and can include a different boron comprising implant as compared to that received by gate structure 208, and may not receive one or more of indium, halogen and carbon co-implants received by gate structure 208. It will be apparent to one skilled in the art that the transistors in the respective blocks (digital logic blocks 810 and 811, SRAM 820, and I/O 830) can have different widths, lengths and threshold voltage implant adjusts.

Experiments were performed to measure the performance of core PMOS transistors that received disclosed co-implanted indium, carbon and fluorine in their drain extension regions, as compared to otherwise equivalent baseline (BL) core PMOS transistors. The core PMOS transistors had a polysilicon gate 100 nm thick, and silicon oxynitride (plasma nitrided silicon oxide dielectric) gate dielectric about 12 Å EOT. The implant conditions received by the disclosed core PMOS transistors comprised indium @2×10¹⁴/cm² at 8 keV, carbon @2×10¹⁴ cm² at 3 keV, and fluorine @1×10¹⁵/cm² at 2 keV. The respective BL and disclosed core PMOS transistors all received a PLDD BF₂ implant @1.5×10¹⁵/cm² at 3.5 keV, a source/drain ¹¹B implant of 7×10¹⁵/cm² at 3 keV, and a UHT laser anneal of 1175° C. for 10 msec.

Electrical measurements performed revealed the disclosed core PMOS transistors having disclosed co-implanted indium, carbon and fluorine in their drain extension regions provided about a 6% increase in drive current at the same leakage level as compared to the BL core PMOS transistors, together with about a 10% reduction in C_(gd) as compared to the BL core PMOS transistors. These results obtained are unexpected and advantageous because as known in the art C_(gd) must generally be increased to increase drive current at the same leakage level.

Thus, adding co-implanted indium, carbon and at least one halogen at PLDD and optionally also at the halo (without indium) and source/drain implants to a boron comprising specie as described herein produces more desirable PMOS transistors by facilitating device scaling and enhancing device performance. For example, as the channel length decreases (e.g., due to device scaling) carrier mobility needs to be increased and/or source/drain resistance (Rsd) needs to be reduced. However, Rsd is limited by sheet resistance (Rsh) in one respect and junction depth (xj) in another respect such that there is a tradeoff between Rsh and xj. In particular, as the channel length is decreased, the junction depth (xj) or depth to which dopants can be implanted is reduced where these shallower implants simultaneously cause an increase in sheet resistance (Rsh) because they effectively act as a thinner resistor. Essentially, adding more dopants to a shallower area does not cause sheet resistance to go down. This is because another limitation, known as active concentration, is reached where no matter how much dopant is implanted, only a certain level of electrical activation can be attained. Beyond a certain (saturation) point there is a limit to how many dopant atoms can be electrically activated, which limits sheet resistance.

Adding indium, carbon and at least one halogen at PLDD to implants of a boron comprising specie as described herein for PMOS transistors has been found to reduce boron diffusion to achieve more abrupt junctions and improves dopant activation levels. More abrupt junctions reduce Cgd and higher activation levels reduce sheet resistance. More abrupt junctions also allow higher dopant levels to be used. Moreover, as described above, for processes including SMT for NMOS performance enhancement, disclosed embodiments also allow the SMT layer to remain on the PMOS transistors during source/drain anneal without significantly degrading the performance of PMOS transistors that allows elimination extra processing otherwise needed to remove the SMT from the PMOS transistors before source/drain annealing.

The active circuitry formed on the substrate having a semiconductor surface comprises circuit elements that may generally include transistors, diodes, capacitors, and resistors, as well as signal lines and other electrical conductors that interconnect the various circuit elements to provide an IC circuit function. Disclosed embodiments can be integrated into a variety of process flows to form a variety of devices and related products. The semiconductor substrates may include various elements therein and/or layers thereon. These can include barrier layers, other dielectric layers, device structures, active elements and passive elements, including source regions, drain regions, bit lines, bases, emitters, collectors, conductive lines, conductive vias, etc. Moreover, disclosed embodiments can be used in a variety of semiconductor device fabrication processes including bipolar, CMOS, BiCMOS and MEMS processes.

Those skilled in the art to which this disclosure relates will appreciate that many other embodiments and variations of embodiments are possible within the scope of the claimed invention, and further additions, deletions, substitutions and modifications may be made to the described embodiments without departing from the scope of this disclosure. 

We claim:
 1. A method of forming an integrated circuit (IC) including at least one PMOS transistor, comprising: performing p-type lightly doped drain (PLDD) implantation to establish source/drain extension regions in a substrate having a semiconductor surface on either side of a gate structure including a gate electrode on a gate dielectric formed on said semiconductor surface, wherein said PLDD implantation comprises co-implanting indium, carbon and a halogen, in addition to a boron comprising specie implant; performing source and drain implantation to establish source/drain regions, wherein said source/drain regions are distanced from said gate structure further than said source/drain extension regions, and source/drain annealing after said performing source and drain implantation, wherein said at least one PMOS transistor includes at least one core PMOS transistor and at least one non-core PMOS transistor, wherein said gate dielectric for said core PMOS transistor is at least 2 Å of equivalent oxide thickness (EOT) thinner as compared to said gate dielectric of said non-core PMOS transistor, and wherein during said PLDD implantation said indium, said halogen and said carbon are implanted into said source/drain extension regions for said core PMOS transistor and at least one of said indium, said halogen and said carbon are not implanted into said source/drain extension regions of said non-core PMOS transistor.
 2. The method of claim 1, further comprising at least one ultra high temperature (UHT) anneal after said co-implanting, said UHT anneal providing a peak anneal temperature of between 1050° C. and 1400° C. and an anneal time at said peak temperature ≦10 seconds.
 3. The method of claim 2, wherein said UHT anneal comprises a laser anneal, and wherein said laser anneal is before said performing source and drain implantation.
 4. The method of claim 1, wherein said halogen comprises fluorine.
 5. The method of claim 1, wherein said gate electrode comprises polysilicon.
 6. The method of claim 1, further comprising at least one of forming halo regions on both sides of said gate structure and co-implanting at least one of said carbon and said halogen into said halo regions and co-implanting at least one of said indium, carbon and said halogen into said source/drain regions.
 7. The method of claim 1, wherein said co-implanting indium comprises a dose between 5×10¹²/cm² and 1×10¹⁵/cm² at an energy between 1 keV to 50 keV and said co-implanting carbon comprises a dose between 5×10¹³/cm² and 3×10¹⁵/cm² at an energy between 1 keV to 20 keV.
 8. The method of claim 1, wherein said co-implanting said halogen comprises implanting fluorine at a dose between 5×10¹³/cm² and 3×10¹⁵/cm² at an energy between 1 keV to 10 keV. 